Multiple alternating phase shift technology for amplifying resolution
US7001695B2 · kind B2 · utility
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5References
10Claims
0Family size
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Key dates
| Filing date | May 9, 2003 |
| Grant date | Feb 21, 2006 |
| Priority date | — |
| Expiry date | Dec 8, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/70
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method and apparatus for improving resolution in photolithography. The method includes steps of mapping a first phase onto a first mask, mapping a second phase onto a second mask, and mapping a trim onto the first mask or second mask (or both). Specifically, the first mask may include Phase1 mapped to 0/180 phase, and the second mask may include Phase2 and trim mapped to 0/180 phase. A set of masks consistent with the foregoing is provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.