Ebo Croffie
14Patents
4h-index
10Co-inventors
53Inventor score
Filing activity: Dec 27, 2002 → Dec 20, 2012
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7313508B2 | Process window compliant corrections of design layout | Physics | 8 | Expired |
| US7189498B2 | Process and apparatus for generating a strong phase shift optical pattern for use in an optical direct write lithography process | Physics | 6 | Expired |
| US7372547B2 | Process and apparatus for achieving single exposure pattern transfer using maskless optical direct write lithography | Physics | 5 | Expired |
| US7325222B2 | Method and apparatus for verifying the post-optical proximity corrected mask wafer image sensitivity to reticle manufacturing errors | Physics | 5 | Expired |
| US7117475B2 | Method and system for utilizing an isofocal contour to perform optical and process corrections | Physics | 4 | Expired |
| US7264906B2 | OPC based illumination optimization with mask error constraints | Physics | 3 | Expired |
| US7270942B2 | Optimized mirror design for optical direct write | Physics | 2 | Expired |
| US8057963B2 | Maskless vortex phase shift optical direct write lithography | Physics | 1 | Active |
| US7458060B2 | Yield-limiting design-rules-compliant pattern library generation and layout inspection | Physics | 1 | Active |
| US7494752B2 | Method and systems for utilizing simplified resist process models to perform optical and process corrections | Physics | 1 | Active |
| US7001695B2 | Multiple alternating phase shift technology for amplifying resolution | Physics | 0 | Expired |
| US8377633B2 | Maskless vortex phase shift optical direct write lithography | Physics | 0 | Active |
| US9188848B2 | Maskless vortex phase shift optical direct write lithography | Physics | 0 | Active |
| US7738078B2 | Optimized mirror design for optical direct write | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.