Source multiplexing in lithography
US7002164B2 · kind B2 · utility
4Cited by
4References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 8, 2003 |
| Grant date | Feb 21, 2006 |
| Priority date | — |
| Expiry date | Feb 23, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/201
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An illumination system for an extreme ultraviolet (EUV) lithography system may include multiple sources of EUV light. The system may combine the light from the multiple sources when illuminating a mask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.