Dense plasma focus radiation source
US7002168B2 · kind B2 · utility
15Cited by
11References
72Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 21, 2003 |
| Grant date | Feb 21, 2006 |
| Priority date | — |
| Expiry date | May 21, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32009
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A dense plasma focus radiation source for generating EUV radiation using Lithium vapor and including a coaxially disposed anode and cathode. The invention includes methods and apparatuses for enhancing the efficiency of EUV radiation production, for protecting, cooling and extending the life of the anode and cathode, for protecting and shielding collecting optics from debris and pressure disturbances in the discharge chamber, and for feeding Lithium into the discharge chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.