User interface for a networked-based mask defect printability analysis system
US7003755B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 20, 2003 |
| Grant date | Feb 21, 2006 |
| Priority date | — |
| Expiry date | Nov 30, 2023 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S977/953
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Mask simulation tools are typically extremely complicated to learn and to use effectively. Therefore, providing access to a mask simulation tool over a wide area network (WAN) to multiple on-line users can be very cost effective. Specifically, in a network-based simulation server, multiple users can view the same mask image, simulations, and analysis results and provide real-time comments to each other as simulation and analysis are performed, thereby encouraging invaluable problem-solving dialogue among users. The user interface for this mask simulation tool can advantageously facilitate this dialogue. For example, the user interface can include an enter box for a user to enter a message and a talk box for capturing any message sent by any user of the simulation tool using the enter box.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.