One component EUV photoresist
US7005227B2 · kind B2 · utility
455Cited by
6References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 21, 2004 |
| Grant date | Feb 28, 2006 |
| Priority date | — |
| Expiry date | Jan 21, 2024 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08F8/30
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
In one embodiment, a photoactive compound may be attached to a polymer backbone. This embodiment may be more resistant to the generation of reactive outgassing components and may exhibit better contrast.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.