Heidi Cao
11Patents
3h-index
7Co-inventors
42Inventor score
Filing activity: Sep 16, 2003 → Jan 5, 2007
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7005227B2 | One component EUV photoresist | Chemistry; Metallurgy | 455 | Expired |
| US7374867B2 | Enhancing photoresist performance using electric fields | Physics | 19 | Expired |
| US7459260B2 | Method of reducing sensitivity of EUV photoresists to out-of-band radiation and EUV photoresists formed according to the method | Physics | 9 | Expired |
| US6872505B1 | Enabling chain scission of branched photoresist | Emerging Cross-Sectional Technologies | 3 | Expired |
| US7166413B2 | Enabling chain scission of branched photoresist | Emerging Cross-Sectional Technologies | 1 | Expired |
| US7723008B2 | Photoactive adhesion promoter in a slam | Physics | 1 | Active |
| US7147986B2 | Resist compounds including acid labile groups attached to polymeric chains at anhydride linkages | Physics | 0 | Expired |
| US7226718B2 | Non-outgassing low activation energy resist | Emerging Cross-Sectional Technologies | 0 | Expired |
| US7427463B2 | Photoresists with reduced outgassing for extreme ultraviolet lithography | Physics | 0 | Expired |
| US7442487B2 | Low outgassing and non-crosslinking series of polymers for EUV negative tone photoresists | Physics | 0 | Expired |
| US7718528B2 | Photoactive adhesion promoter in a SLAM | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.