Apparatus and method for reducing the electron-beam-induced deposition of contamination products
US7005638B2 · kind B2 · utility
2Cited by
5References
15Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Mar 8, 2004 |
| Grant date | Feb 28, 2006 |
| Priority date | — |
| Expiry date | Mar 8, 2024 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/022
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
In a device for examining a specimen with an electron beam, in particular an SEM, TEM, or CSEM, contamination products are often result from the irradiation. To reduce these contamination products, the surface of the object irradiated with the electron beam is simultaneously illuminated with light, in particular with UV light.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.