Leica Microsystems Semiconductor GmbH
23Patents
1Active
23Granted
35Portfolio score
Filing activity: Jun 21, 2000 → Sep 17, 2004 · 1 expiring within 5 years
Most-cited patents
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7152488B2 | System operating unit | Mechanical Engineering; Lighting; Heating | 82 | Expired |
| US6633375B1 | Method and device for optically examining structured surfaces of objects | Electricity | 34 | Expired |
| US6920249B2 | Method and measuring instrument for determining the position of an edge of a pattern element on a substrate | Physics | 24 | Expired |
| US6879440B2 | Autofocus module and method for a microscope-based system | Physics | 15 | Expired |
| US6812446B2 | Autofocus module for microscope-based systems | Physics | 10 | Expired |
| US7417719B2 | Method, device and software for the optical inspection of a semi-conductor substrate | Physics | 9 | Expired |
| US6960755B2 | Contact sensor, and apparatus for protecting a protruding component | Electricity | 9 | Expired |
| US7050223B1 | DUV-capable microscope objective with parfocal IR focus | Physics | 6 | Expired |
| US7180585B2 | Apparatus for wafer inspection | Physics | 5 | Expired |
| US6778260B2 | Coordinate measuring stage and coordinate measuring instrument | Physics | 4 | Expired |
| US6924900B2 | Method and microscope for detection of a specimen | Physics | 4 | Expired |
| US6919658B2 | Coordinate measuring stage | Emerging Cross-Sectional Technologies | 4 | Expired |
| US6975409B2 | Illumination device; and coordinate measuring instrument having an illumination device | Physics | 3 | Expired |
| US6816253B1 | Substrate holder, and use of the substrate holder in a highly accurate measuring instrument | Electricity | 3 | Expired |
| US7209243B2 | Illumination device, and coordinate measuring instrument having an illumination device | Physics | 2 | Expired |
| US7005638B2 | Apparatus and method for reducing the electron-beam-induced deposition of contamination products | Electricity | 2 | Expired |
| US7019910B2 | Inspection microscope and objective for an inspection microscope | Physics | 2 | Expired |
| US6816263B2 | Interferometric measurement apparatus for wavelength calibration | Physics | 2 | Expired |
| US6662661B2 | Method of measuring oscillatory semiconductor membranes and shielding for external excitations in the measurement | Physics | 2 | Expired |
| US7081963B2 | Substrate holder, and use of the substrate holder in a highly accurate measuring instrument | Electricity | 1 | Expired |
| US6825939B2 | Method and measuring arrangement for detecting an object | Physics | 1 | Expired |
| US7375792B2 | Apparatus for measuring feature widths on masks for the semiconductor industry | Physics | 0 | Active |
| US6943901B2 | Critical dimension measuring instrument | Physics | 0 | Expired |
Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.