Lithographic apparatus and device manufacturing method
US7009682B2 · kind B2 · utility
156Cited by
19References
41Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Nov 18, 2003 |
| Grant date | Mar 7, 2006 |
| Priority date | — |
| Expiry date | Dec 20, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70341
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In an immersion lithography apparatus, an isolator is provided between the substrate table and the projection system to, for example, prevent currents in the liquid exerting forces on the projection system that might tend to distort the reference frame to which said projection system is connected. The isolator may be maintained still relative to the reference frame by an actuator system responsive to a position sensor mounted on the reference frame. At least a portion of the isolator may have the same refractive index as the liquid.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.