Extending the range of lithographic simulation integrals

US7010776B2 · kind B2 · utility

Assignee

• International Business Machines Corporation · US

Inventors

• Gregg M. Gallatin · Newtown, US
• Emanuel Gofman · Haifa, IL
• Kafai Lai · Poughkeepsie, US
• Mark A. Lavin · Katonah, US
• Maharaj Mukherjee · Poughkeepsie, US
• Dov Ramm · Gdera, IL
• Alan E. Rosenbluth · Yorktown Heights, US
• Shlomo Shlafman · Haifa, IL

Key dates

• Filing date: Oct 27, 2003
• Grant date: Mar 7, 2006
• Expiry date: Apr 19, 2024

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F1/70
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A method for calculating long-range image contributions from mask polygons. An algorithm is introduced having application to Optical Proximity Correction in optical lithography. A finite integral for each sector of a polygon replaces an infinite integral. Integrating over two triangles, rather than integrating on the full sector, achieves a finite integral. An analytical approach is presented for a power law kernel to reduce the numerical integration of a sector to an analytical expression evaluation. The mask polygon is divided into regions to calculate interaction effects, such as intermediate-range and long-range effects, by truncating the mask instead of truncating the kernel function.