Lithographic apparatus and device manufacturing method
US7012264B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 4, 2004 |
| Grant date | Mar 14, 2006 |
| Priority date | — |
| Expiry date | Jun 4, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70716
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic apparatus is provided. The apparatus includes an illumination system that conditions a beam of radiation, an article support member that supports an article to be placed in a beam path of the beam of radiation on the article support, and a movable carriage for moving the article support member. The carriage includes a compartmented composite structure provided with a non-composite mounting interface and/or cooling interface With such an arrangement, conventional interfacing using, for example metal or ceramic materials, can be applied in combination with the advantages of composite structures, such as a low specific weight, a high Young's modulus at places and directions where required, high strength, high stability, and high electrical resistivity.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.