Controlled use of photochemically susceptible chemistries for etching, cleaning and surface conditioning
US7018938B2 · kind B2 · utility
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5References
9Claims
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Key dates
| Filing date | Nov 14, 2002 |
| Grant date | Mar 28, 2006 |
| Priority date | — |
| Expiry date | Jun 6, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/02052
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Radiant energy may be applied to a photochemically susceptible etching or conditioning solution to enable precise control of the removal of material or alteration of the top surface of a wafer during the fabrication of semiconductor integrated circuits. A particular condition may be detected during the course of photoactivated generation of free radicals or molecular activation to control the further generation of said species by controlling the radiant energy exposure of a wafer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.