Apparatus for exposing substrate materials
US7019818B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 14, 2004 |
| Grant date | Mar 28, 2006 |
| Priority date | — |
| Expiry date | Sep 14, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70766
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The invention relates to a device for exposing substrate materials comprising: at least one optical exposure device, at least one substrate platform; a device for generating a relative displacement between the exposure device and the substrate platform in two transversal directions, whereby the relative displacement in a primary direction occurs with a greater dynamic response than in a secondary direction; at least one primary drive for generating the relative displacement in the primary direction; and at least one secondary drive for generating the relative displacement in the secondary direction. The aim of the invention is to position the substrate platform with the greatest possible accuarcy and the greatest possible dynamic response. To achieve this, the device comprises two substrate platforms that move substantially in opposition to one another in the primary direction.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.