Method for determining wavefront aberrations

US7019846B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Wolfgang Emer · Aalen, DE
• Paul Graeupner · Aalen, DE

Key dates

• Filing date: May 27, 2003
• Grant date: Mar 28, 2006
• Expiry date: Feb 19, 2024

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/706
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

In a method for determining wavefront aberrations for the characterization of imaging characteristics in an optical imaging system, the measurement results from two different measurement methods, which are carried out at successive times, are combined. In this case, at least some of the aberration parameters which are determined in the previous first measurement method are used as a given precondition for determining aberration parameters with the aid of the second measurement method, and are assessed accordingly. This results in a hybrid method, in which the strength of at least two measurement methods are used in a combined form, and specific weaknesses of any one method can be avoided.