Paul Graeupner
21Patents
6h-index
36Co-inventors
65Inventor score
Filing activity: May 27, 2003 → Feb 24, 2020
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7227616B2 | Method for improving an optical imaging property of a projection objective of a microlithographic projection exposure apparatus | Physics | 48 | Expired |
| US7209292B2 | Projection objective, especially for microlithography, and method for adjusting a projection objective | Physics | 46 | Expired |
| US7352435B2 | Lithographic apparatus and device manufacturing method | Physics | 17 | Expired |
| US7233386B2 | Method of optimizing imaging performance | Physics | 9 | Expired |
| US7800732B2 | Projection exposure method and projection exposure apparatus for microlithography | Physics | 7 | Active |
| US7570345B2 | Method of optimizing imaging performance | Physics | 6 | Active |
| US7310187B2 | Projection objective, especially for microlithography, and method for adjusting a projection objective | Physics | 6 | Active |
| US8605257B2 | Projection system with compensation of intensity variations and compensation element therefor | Physics | 5 | Active |
| US8027091B2 | Method for correcting optical proximity effects | Physics | 3 | Active |
| US7019846B2 | Method for determining wavefront aberrations | Physics | 3 | Expired |
| US7961293B2 | Lithographic apparatus and device manufacturing method | Physics | 3 | Active |
| US7209241B2 | Method for determining wavefront aberrations | Physics | 1 | Expired |
| US8416390B2 | Illumination system for illuminating a mask in a microlithographic exposure apparatus | Physics | 1 | Active |
| US8917379B2 | Projection exposure methods and systems | Physics | 1 | Active |
| US9690203B2 | Method for adjusting an illumination setting | Physics | 0 | Active |
| US8237915B2 | Method for improving an optical imaging property of a projection objective of a microlithographic projection exposure apparatus | Physics | 0 | Active |
| US11366382B2 | Method and apparatus for performing an aerial image simulation of a photolithographic mask | Physics | 0 | Active |
| US8711330B2 | Lithographic apparatus and device manufacturing method | Physics | 0 | Active |
| US9885958B2 | Projection exposure methods and systems | Physics | 0 | Active |
| US8405907B2 | Method for correcting optical proximity effects | Physics | 0 | Active |
| US7649702B2 | Immersion lithography objective | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.