High resolution gas gauge proximity sensor
US7021120B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 28, 2004 |
| Grant date | Apr 4, 2006 |
| Priority date | — |
| Expiry date | Jul 3, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7057
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
In a gas gauge, effects due to changes in the local environment are reduced by causing a measurement nozzle and a reference nozzle to react as if they were co-located, or located at approximately the same position. This is achieved by venting the reference nozzle in very close proximity to the measurement nozzle. A reference chamber surrounding the reference plate and reference nozzle is vented at approximately the same location as the measurement nozzle. In an embodiment for use in a vacuum environment, the measurement nozzle is surrounded with an annular ring. The measurement annular ring is connected to an annular ring around the reference nozzle, which acts to co-locate the reference nozzle and the measurement nozzle. To avoid choked flow, another annular ring or rings may be placed around the measurement annular ring.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.