Method and system for yield similarity of semiconductor devices
US7024334B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jun 29, 2004 |
| Grant date | Apr 4, 2006 |
| Priority date | — |
| Expiry date | Jun 29, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01R31/2894
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method and system for yield similarity of semiconductor devices. The method includes providing a first plurality of semiconductor devices, providing a second plurality of semiconductor devices, obtaining a first plurality of yields associated with a first yield, and obtaining a second plurality of yields associated with a second yield. Additionally, the method includes performing a first statistical analysis for the first plurality of yields, determining a first statistical distribution, performing a second statistical analysis for the second plurality of yields, and determining a second statistical distribution. Moreover, the method includes processing information associated with the first statistical distribution and the second statistical distribution, and determining an indicator. Also, the method includes processing information associated with the indicator, determining a confidence level, processing information associated with the confidence level, and determining whether the first yield and the second yield are similar.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.