Antireflective coating compositions
US7026101B2 · kind B2 · utility
1Cited by
21References
35Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 30, 2001 |
| Grant date | Apr 11, 2006 |
| Priority date | — |
| Expiry date | Jul 30, 2021 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/151
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Antireflective compositions are provided that contain a basic additive material. Such use of a basic material can significantly decrease or even completely eliminate notching of an overcoated photoresist relief image. Antireflective formulations of the invention are preferably crosslinking compositions and may contain a resin component in addition to the basic additive. Antireflective compositions of the invention can be effectively used at a variety of wavelengths used to expose an overcoated photoresist layer, including 248 nm and 193 nm.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.