Fluoropolymer
US7026416B2 · kind B2 · utility
1Cited by
8References
4Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 9, 2005 |
| Grant date | Apr 11, 2006 |
| Priority date | — |
| Expiry date | May 9, 2025 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08F36/20
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
To provide a fluoropolymer suitable for use as a base polymer for resist materials for excimer lasers having a wavelength of 250 nm or shorter.A fluoropolymer having a monomer unit formed by cyclopolymerization of a fluorinated diene compound represented by the following formula (3),CF2═CFCF2—C(CF3)(R5)—CH2CH═CH2 (3)wherein R5 is either a hydroxyl group blocked by —CHR7—O—R8 or an organic group having the hydroxyl group, and R8 is a cyclic saturated hydrocarbon such as a cycloalkyl group which may have a substituent, or an organic group having the cyclic saturated hydrocarbon.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.