Patent · US Expired

Method for cutting a block of material and forming a thin film

US7029548B2 · kind B2 · utility

17Cited by
9References
13Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 11, 2001
Grant dateApr 18, 2006
Priority date
Expiry dateJul 11, 2021

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T156/1967
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A process for cutting out a block of material includes a step of introducing ions in the block thereby forming an embrittled zone and defining at least one superficial part of the block. The method also includes a step of forming at least one separation initiator at the level of the embrittled zone, wherein the step of forming the separation initiator includes implanting ions of an ionic nature different from that introduced during the preceding step. The method further includes a step of separating at the level of the embrittled zone the superficial part of the block from a remaining part of the block from the separation initiator, wherein the separation step includes at least one of a thermal treatment and the application of mechanical forces acting between the superficial part and the embrittled zone.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.