Electrochemical edge and bevel cleaning process and system
US7029567B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Dec 20, 2002 |
| Grant date | Apr 18, 2006 |
| Priority date | — |
| Expiry date | Sep 28, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67051
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An edge cleaning system and method is disclosed in which a directed stream of a mild etching solution is supplied to an edge area of a rotating workpiece, including the front surface edge and bevel, while a potential difference between the workpiece and the directed stream is maintained. In one aspect, the present invention provides an edge cleaning system that is disposed in the same processing chamber that is used for deposition or removal processing of the workpiece. In another aspect, the mild etching solution used for edge removal is also used to clean the front surface of the wafer, either simultaneously with or sequentially with the edge removal process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.