Substrate material for X-ray optical components

US7031428B2 · kind B2 · utility

Assignees

• Carl Zeiss SMT GmbH · DE
• Schott AG · DE

Inventors

• Udo Dinger · Oberkochen, DE
• Frank Eisert · Aalen, DE
• Martin Weiser · Sinsheim, DE
• Konrad Knapp · Mainz, DE
• Ina Mitra · Stadecken-Elsheim, DE
• Hans Morian · Schlangenbad, DE

Key dates

• Filing date: Feb 13, 2004
• Grant date: Apr 18, 2006
• Expiry date: Mar 20, 2024

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C03C2204/08
• WIPO field: Materials, metallurgy
• WIPO sector: Chemistry

Abstract

There is provided a substrate material for an optical component for X-rays of wavelength λR. The substrate includes (a) a glass phase made of amorphous material having a positive coefficient of thermal expansion, and (b) a crystal phase including microcrystallites having a negative coefficient of thermal expansion and a mean size of less than about 4 λR. The substrate material has a stoichiometric ratio of the crystal phase to the glass phase such that a coefficient of thermal expansion of the substrate material is less than about 5×10−6 K−1 in a temperature range of about 20 °C. to 100°C. The substrate material, following a surface treatment, has a high spatial frequency roughness (HSFR) of less than about λR/30 rms.