Frank Eisert
6Patents
3h-index
19Co-inventors
50Inventor score
Filing activity: Sep 27, 2003 → Feb 18, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7118449B1 | Method of manufacturing an optical element | Performing Operations; Transporting | 11 | Expired |
| US7481543B1 | Mirror for use in a projection exposure apparatus | Performing Operations; Transporting | 6 | Active |
| US7031428B2 | Substrate material for X-ray optical components | Chemistry; Metallurgy | 3 | Expired |
| US7557902B2 | Projection objective | Physics | 3 | Expired |
| US9436101B2 | Optical arrangement and microlithographic projection exposure apparatus including same | Physics | 2 | Active |
| US12235097B2 | Diffractive optical element for a test interferometer | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.