Method of developing a resist film and a resist development processor
US7033089B2 · kind B2 · utility
4Cited by
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4Claims
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Key dates
| Filing date | Nov 13, 2003 |
| Grant date | Apr 25, 2006 |
| Priority date | — |
| Expiry date | Nov 13, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03D3/00
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention provides a resist development processor consisting of a development processing chamber for storing a resist substrate having an exposed resist on the substrate and for developing the exposed resist by means of a development solvent consisting of a supercritical fluid; and a supercritical fluid container for storing a supercritical fluid, where the supercritical fluid container is connected to the development processing chamber through a valve.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.