Radiation system, contamination barrier, lithographic apparatus, device manufacturing method and device manufactured thereby
US7034308B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 23, 2004 |
| Grant date | Apr 25, 2006 |
| Priority date | — |
| Expiry date | Jun 23, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70916
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A radiation system includes a contamination barrier, e.g., a foil trap, between a collector, for example a normal incidence collector, and a radiation source, such that radiation coming from the source passes the foil trap twice. The radiation passes the contamination barrier once before hitting the collector and a second time after reflection by the collector. The foil trap includes lamellas that are parallel to both the radiation coming from the light source, and to the radiation reflected by the collector. The radiation is thus not obstructed by the foil trap. In this way, a normal incidence collector, which is used with a plasma produced source, can be protected from debris coming from a EUV source.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.