Exposure apparatus, maintenance method therefor, semiconductor device manufacturing method using the apparatus, and semiconductor manufacturing factory
US7034918B2 · kind B2 · utility
3Cited by
10References
6Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Mar 21, 2005 |
| Grant date | Apr 25, 2006 |
| Priority date | — |
| Expiry date | Mar 21, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70975
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure apparatus includes a reticle stage which holds a reticle, a projection optical system which projects a pattern of the reticle onto a substrate, a reticle surface plate which is a base plate disposed between the reticle and the projection optical system and which supports the reticle stage. The reticle surface plate has an opening for transmitting exposure light. The exposure apparatus further includes a sheet glass set on the reticle surface plate so as to separate a space inside the opening of the reticle surface plate from a space above the reticle surface plate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.