System and method for process contamination prevention for semiconductor manufacturing
US7035705B2 · kind B2 · utility
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13References
17Claims
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Key dates
| Filing date | Mar 3, 2004 |
| Grant date | Apr 25, 2006 |
| Priority date | — |
| Expiry date | Mar 3, 2024 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P90/02
- WIPO fieldControl
- WIPO sectorInstruments
Abstract
Provided are a system and method for preventing contamination in a semiconductor manufacturing environment. The method includes comparing one or more attributes associated with a product, such as a substrate, with one or more attributes associated with an operation. If the comparison indicates that the product is not compatible with the operation, then the operation is suspended with respect to the product. If the comparison indicates that the product is compatible with the operation, then the operation is performed on the product.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.