RF delivery configuration in a plasma processing system
US7042311B1 · kind B1 · utility
80Cited by
30References
31Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 10, 2003 |
| Grant date | May 9, 2006 |
| Priority date | — |
| Expiry date | Dec 7, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH03H7/40
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
In one embodiment, a system for delivering radio frequency (RF) power to a plasma processing system includes an automatic impedance matching network configured to receive RF power from an RF generator, and a fixed impedance matching network coupled between the automatic impedance matching network and the plasma processing chamber. The fixed impedance matching network may be configured to transform a first impedance presented by the chamber to a second impedance that allows the automatic impedance matching network to operate within a tuning range.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.