Semiconductor wafer fabrication furnace idle monitor and method of operation
US7043317B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 30, 2003 |
| Grant date | May 9, 2006 |
| Priority date | — |
| Expiry date | Apr 9, 2024 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P90/02
- WIPO fieldControl
- WIPO sectorInstruments
Abstract
A system and method is disclosed for monitoring each of a plurality of furnaces in a furnace process in semiconductor wafer fabrication. A furnace that is left open too long will absorb moisture from the atmosphere and should not be used for a furnace task. The system of the invention comprises a furnace resource allocator that comprises a furnace idle timer unit that keeps track of how long each furnace has been open. If the idle time for a selected furnace exceeds a predetermined limit, that furnace is rejected and another furnace is selected for use. Each furnace that is rejected is subjected to a furnace cycle purge process to remove moisture from the furnace so that the furnace may again be available for use.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.