Method for producing micromechanic sensors and sensors produced by said method
US7045382B2 · kind B2 · utility
8Cited by
10References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 13, 2002 |
| Grant date | May 16, 2006 |
| Priority date | — |
| Expiry date | Mar 13, 2022 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB81C2203/0742
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Proposed is a method for manufacturing micromechanical sensors and sensors manufactured by this method, where openings are introduced into a semiconductor substrate. After the openings are introduced into the semiconductor substrate, a subsequent temperature treatment is carried out, in which the openings are converted into voids in the depth of the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.