Patent · US Expired

Column simultaneously focusing a partilce beam and an optical beam

US7045791B2 · kind B2 · utility

19Cited by
60References
20Claims
0Family size

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Inventors

Key dates

Filing dateMar 19, 2001
Grant dateMay 16, 2006
Priority date
Expiry dateApr 28, 2021

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01J2237/31749
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

The invention concerns a column for producing a focused particle beam comprising: a device (100) focusing particles including an output electrode (130) with an output hole (131) for allowing through a particle beam (A); an optical focusing device (200) for simultaneously focusing an optical beam (F) including an output aperture (230). The invention is characterized in that said output aperture (230) is transparent to the optical beam (F), while said output electrode (130) is formed by a metallic insert (130) maintained in said aperture (230) and bored with a central hole (131) forming said output orifice.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.