Exposure apparatus and exposure method
US7050149B2 · kind B2 · utility
32Cited by
11References
33Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 10, 2004 |
| Grant date | May 23, 2006 |
| Priority date | — |
| Expiry date | Dec 10, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70825
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure apparatus able to maintain reflectances of mirrors and transmittances of lenses and to maintain initial performance over a long period by using exposure light of a wavelength of the vacuum ultraviolet region to illuminate a mask and transfer images of patterns on the mask to a substrate, provided with a gas feed unit for supplying a light path space through which the exposure light passes with a gas mainly comprised of an inert gas or rare gas and introducing a predetermined concentration of hydrogen into the gas fed to at least part of the light path space.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.