Advanced exposure techniques for programmable lithography
US7050155B2 · kind B2 · utility
10Cited by
8References
4Claims
0Family size
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Key dates
| Filing date | Oct 30, 2002 |
| Grant date | May 23, 2006 |
| Priority date | — |
| Expiry date | Mar 29, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70291
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Advanced techniques for programmable photolithograhy provide enhanced resolution and other aspects of a photolithography system. The pseudo-inverse of a matrix is applied to the results of a calculation to control exposure energies.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.