Exposure apparatus
US7057701B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 26, 2004 |
| Grant date | Jun 6, 2006 |
| Priority date | — |
| Expiry date | Jun 24, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70216
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure apparatus for exposing a substrate to light via a mask. The apparatus includes a projection optical system configured to project a pattern of the mask onto the substrate, a cover configured to surround a path of light from the projection optical system toward the substrate, a first supply port arranged inside the cover and configured to supply inert gas inside the cover, a first recovery port arranged inside the cover and configured to recover gas inside the cover, a second supply port arranged outside the cover and configured to supply gas outside the cover, and a second recovery port arranged outside the cover and configured to recover gas outside the cover. The first direction from the first supply port to the first recovery port and a second direction from the second supply port to the second recovery port oppose each other at an angle not greater than 90°.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.