Novolak resin solution, positive photoresist composition and preparation method thereof
US7060410B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 15, 2003 |
| Grant date | Jun 13, 2006 |
| Priority date | — |
| Expiry date | Jul 18, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0236
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
There is provided a method of producing a resist composition which yields a resist composition with good storage stability, and no fluctuation in characteristics between production lots. There are provided: a novolak resin solution formed by adding benzoquinone to a novolak resin solution produced by dissolving a novolak resin in an organic solvent; a positive photoresist composition comprising the novolak resin solution and a photosensitive component; a positive photoresist composition comprising the novolak resin solution, a photosensitive component, and hydroquinone; and a method of producing a positive photoresist composition involving mixing the novolak resin solution described above and a photosensitive component.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.