Lithographic apparatus and device manufacturing method
US7061579B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 16, 2003 |
| Grant date | Jun 13, 2006 |
| Priority date | — |
| Expiry date | Dec 16, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/709
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic apparatus is disclosed. The apparatus includes an illumination system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate support that supports a substrate, a projection system that projects the patterned beam onto a target portion of the substrate, and a reference frame that provides a reference surface with respect to which a position of at least one of the substrate and the patterning structure is measured. The reference frame includes a material that has a coefficient of thermal expansion of greater than about 2.9×10−6/K.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.