System and method of correcting mask rule violations after optical proximity correction
US7062748B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Aug 25, 2003 |
| Grant date | Jun 13, 2006 |
| Priority date | — |
| Expiry date | Aug 19, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F30/398
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method is provided for correcting rule violating areas of a photomask using a digital representation of the photomask. The method includes identifying violating areas of the photomask from a digital representation of the photomask. The violating areas include areas that violate a minimum width rule and/or areas that violate a minimum space rule for the photomask. The violating areas are then manipulated for the purpose of eliminating the violating areas. They are manipulated differently based on whether the violating area lies inside a design shape of a layout pattern to be imaged using the photomask and/or whether the violating area lies outside the design shape.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.