Precursors for silica or metal silicate films
US7064227B1 · kind B1 · utility
4Cited by
0References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 9, 2004 |
| Grant date | Jun 20, 2006 |
| Priority date | — |
| Expiry date | Jan 17, 2025 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/40
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
A composition selected from the group consisting of bis(tert-butoxy)(isopropoxy)silanol, bis(isopropoxy)(tert-butoxy)silanol, bis(tert-pentoxy)(isopropoxy)silanol, bis(isopropoxy)(tert-pentoxy)silanol, bis(tert-pentoxy)(tert-butoxy)silanol, bis(tert-butoxy)(tert-pentoxy)silanol and mixtures thereof; its use to form a metal or metalloid silicate layer on a substrate and the synthesis of the mixed alkoxysilanols.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.