Ron Rulkens
21Patents
9h-index
40Co-inventors
71Inventor score
Filing activity: Jun 19, 2002 → Jul 12, 2018
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7790633B1 | Sequential deposition/anneal film densification method | Electricity | 598 | Active |
| US7148155B1 | Sequential deposition/anneal film densification method | Electricity | 384 | Expired |
| US7297608B1 | Method for controlling properties of conformal silica nanolaminates formed by rapid vapor deposition | Electricity | 60 | Expired |
| US7202185B1 | Silica thin films produced by rapid surface catalyzed vapor deposition (RVD) using a nucleation layer | Electricity | 33 | Expired |
| US6762849B1 | Method for in-situ film thickness measurement and its use for in-situ control of deposited film thickness | Physics | 29 | Expired |
| US7097878B1 | Mixed alkoxy precursors and methods of their use for rapid vapor deposition of SiO2 films | Chemistry; Metallurgy | 23 | Expired |
| US7129189B1 | Aluminum phosphate incorporation in silica thin films produced by rapid surface catalyzed vapor deposition (RVD) | Electricity | 20 | Expired |
| US7271112B1 | Methods for forming high density, conformal, silica nanolaminate films via pulsed deposition layer in structures of confined geometry | Electricity | 13 | Expired |
| US6919279B1 | Endpoint detection for high density plasma (HDP) processes | Electricity | 12 | Expired |
| US7223707B1 | Dynamic rapid vapor deposition process for conformal silica laminates | Electricity | 9 | Expired |
| US7294583B1 | Methods for the use of alkoxysilanol precursors for vapor deposition of SiO2 films | Electricity | 6 | Expired |
| US7491653B1 | Metal-free catalysts for pulsed deposition layer process for conformal silica laminates | Electricity | 4 | Active |
| US7064227B1 | Precursors for silica or metal silicate films | Chemistry; Metallurgy | 4 | Expired |
| US9169548B1 | Photovoltaic cell with copper poor CIGS absorber layer and method of making thereof | Emerging Cross-Sectional Technologies | 2 | Active |
| US10043921B1 | Photovoltaic cell with high efficiency cigs absorber layer with low minority carrier lifetime and method of making thereof | Emerging Cross-Sectional Technologies | 1 | Active |
| US7972652B2 | Electroless plating system | Chemistry; Metallurgy | 1 | Active |
| US7913644B2 | Electroless deposition system | Electricity | 1 | Active |
| US10211351B2 | Photovoltaic cell with high efficiency CIGS absorber layer with low minority carrier lifetime and method of making thereof | Emerging Cross-Sectional Technologies | 0 | Active |
| US9255323B2 | Sputtering target including a feature to reduce chalcogen build up and arcing on a backing tube | Emerging Cross-Sectional Technologies | 0 | Active |
| US9128493B2 | Method and apparatus for plating solution analysis and control | Physics | 0 | Active |
| US8622017B2 | Electroless plating system | Chemistry; Metallurgy | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.