Titanium carboxylate films for use in semiconductor processing
US7067346B2 · kind B2 · utility
8Cited by
27References
29Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 26, 2003 |
| Grant date | Jun 27, 2006 |
| Priority date | — |
| Expiry date | Jun 6, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D64/691
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
The present invention involves the formation of titanium carbonate films that exhibit improved hydrolytic stability and photosensitivity. Such films can be used in semiconductor processing to deposit titanium and titanium oxide layers on a substrate and to form patterns without the use of photoresists. Preferred titanium carboxylates are non-branched and branched carboxylates wherein the alkoxide component is an alcohol, branched titanium carboxylates wherein the alkoxide component is a diol, non-branched and branched titanium alpha hydroxy carboxylate compounds, and titanium dicarboxylate compounds.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.