Sublimating process for cleaning and protecting lithography masks
US7070832B2 · kind B2 · utility
6Cited by
5References
10Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Sep 11, 2003 |
| Grant date | Jul 4, 2006 |
| Priority date | — |
| Expiry date | Nov 13, 2023 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31504
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Spraying a surface of a reticle with carbon dioxide snow cleans the surface and removes particles. Further spraying the surface of the reticle with carbon dioxide snow at a temperature below a carbon dioxide sublimation temperature forms a solid carbon dioxide layer on the surface. The solid carbon dioxide layer prevents particles from contacting the surface of the reticle. The solid carbon dioxide layer may be removed, and the reticle may be used in a extreme ultraviolet lithography tool.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.