Line-narrowed gas laser system
US7072375B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Feb 20, 2003 |
| Grant date | Jul 4, 2006 |
| Priority date | — |
| Expiry date | Oct 20, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S3/139
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In a line-narrowed gas laser system such as a line-narrowed molecular fluorine laser system, ASE is cut off to obtain a spectral linewidth of 0.2 pm or lower and a spectral purity of 0.5 pm or lower. The laser system comprises a laser chamber filled with an F2-containing laser gas, discharge electrodes located in the laser chamber, a laser resonator and a line-narrowing module located in the laser resonator with a wavelength selection element, so that a line-narrowed laser beam emerges from the laser resonator. To cut off ASE from the laser beam emerging from the laser resonator, the duration from laser emission by discharge to generation of a laser beam is preset. Rise of the sidelight is made so gentle that the starting point of a laser pulse can exist after the time of the first sidelight peak.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.