Projection optical system and projection exposure apparatus
US7075726B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 16, 2001 |
| Grant date | Jul 11, 2006 |
| Priority date | — |
| Expiry date | Mar 19, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70275
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A projection optical system projects an image of an object onto an image plane, and includes a first imaging optical system for forming an image of the object, and a second imaging optical system for re-imaging the image upon the image plane, wherein the first and second imaging optical systems are disposed in an order from the object side and are disposed along a common straight optical axis. The first imaging optical system includes a first mirror for reflecting and collecting abaxial light from the object, wherein one of the first and second imaging optical systems includes a second mirror for reflecting light from the first mirror to the image plane side, and wherein, with the second mirror, the abaxial light is caused to pass an outside of an effective diameter of the first mirror.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.