Optics for extreme ultraviolet lithography
US7078700B2 · kind B2 · utility
9Cited by
4References
23Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 30, 2004 |
| Grant date | Jul 18, 2006 |
| Priority date | — |
| Expiry date | Dec 23, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG21K1/06
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
According to an embodiment of the invention, extreme ultraviolet (EUV) photolithography is performed using lobster eye transmission optics. A light source, such as a source plasma, is located at the center of a circle. Several mirror segments are arranged on an arc of the circle. The mirror segments may be arranged so that the light generated by the light source is collimated after being reflected. The light source may be a source plasma capable of generating EUV photons.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.