Bryan Rice
16Patents
6h-index
12Co-inventors
55Inventor score
Filing activity: Dec 31, 2002 → Jun 12, 2007
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7180082B1 | Method for plasma formation for extreme ultraviolet lithography-theta pinch | Electricity | 54 | Expired |
| US7230258B2 | Plasma-based debris mitigation for extreme ultraviolet (EUV) light source | Electricity | 27 | Expired |
| US7153615B2 | Extreme ultraviolet pellicle using a thin film and supportive mesh | Emerging Cross-Sectional Technologies | 15 | Expired |
| US7078700B2 | Optics for extreme ultraviolet lithography | Physics | 9 | Expired |
| US7652272B2 | Plasma-based debris mitigation for extreme ultraviolet (EUV) light source | Electricity | 7 | Active |
| US7049614B2 | Electrode in a discharge produced plasma extreme ultraviolet source | Physics | 6 | Expired |
| US7446329B2 | Erosion resistance of EUV source electrodes | Electricity | 3 | Expired |
| US7098466B2 | Adjustable illumination source | Physics | 3 | Expired |
| US6847044B2 | Electrical discharge gas plasma EUV source insulator components | Physics | 2 | Expired |
| US6787788B2 | Electrode insulator materials for use in extreme ultraviolet electric discharge sources | Physics | 2 | Expired |
| US7527920B2 | Active hardmask for lithographic patterning | Physics | 2 | Expired |
| US7033739B2 | Active hardmask for lithographic patterning | Physics | 2 | Expired |
| US7109504B2 | Extreme ultraviolet illumination source | Physics | 1 | Expired |
| US7567379B2 | Technique to prevent tin contamination of mirrors and electrodes in an EUV lithography system | Physics | 0 | Active |
| US7208747B2 | Adjustment of distance between source plasma and mirrors to change partial coherence | Physics | 0 | Expired |
| US7329588B2 | Forming a reticle for extreme ultraviolet radiation and structures formed thereby | Electricity | 0 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.