Lithographic apparatus and method of manufacturing a device and method of performing maintenance
US7078708B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 24, 2003 |
| Grant date | Jul 18, 2006 |
| Priority date | — |
| Expiry date | Jul 13, 2024 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3174
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A lithographic apparatus includes an illumination system for providing a beam of radiation. The lithographic apparatus further includes: a support structure for supporting patterning device, the patterning device serving to impart the beam with a pattern in its cross-section; a substrate table for holding a substrate; and a projection system for projecting the patterned beam onto a target portion of the substrate. The lithographic apparatus includes a vacuum system in which at least the illumination system and the substrate table are present. The vacuum system includes at least two separate vacuum modules. A first vacuum module includes at least the projection system and/or the illumination system. A second vacuum module includes the substrate table. At least two of the vacuum modules are connected to each other via a closable connection.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.