Semiconductor memory device and method for producing the same
US7078762B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 6, 2004 |
| Grant date | Jul 18, 2006 |
| Priority date | — |
| Expiry date | Jul 29, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11C2216/06
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
Disclosed is a non-volatile semiconductor memory device that uses a inversion layer provided on a semiconductor substrate as a data line. The memory device can reduce variation of characteristics among memory cells and can reduce bit cost. A plurality of assist gates are formed in the upper part of a p-type well through a gate oxide film. In the upper part of an interlayer insulator that covers those assist gates are formed word lines that are used as control electrodes. The width of those word lines is, for example, 0.1 μm, and each word line is separated from its adjacent word lines by a side wall spacer that is a silicon oxide film having a thickness of about 20 nm.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.