Use of amorphous carbon film as a hardmask in the fabrication of optical waveguides
US7079740B2 · kind B2 · utility
24Cited by
83References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 12, 2004 |
| Grant date | Jul 18, 2006 |
| Priority date | — |
| Expiry date | Apr 17, 2024 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P40/57
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
Methods are provided for forming optical devices, such as waveguides, with minimal defect formation. In one aspect, the invention provides a method for forming a waveguide structure on a substrate surface including forming a cladding layer on the substrate surface, forming a core layer on the cladding layer, depositing an amorphous carbon hardmask on the core layer, forming a patterned photoresist layer on the amorphous carbon hardmask, etching the amorphous carbon hardmask, and etching the core material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.