Supporting device, lithographic apparatus, and device manufacturing method employing a supporting device, and a position control system arranged for use in a supporting device
US7084956B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 10, 2004 |
| Grant date | Aug 1, 2006 |
| Priority date | — |
| Expiry date | Nov 15, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70933
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A supporting device for supporting in a lithographic projection apparatus a supported part relative to a supporting part, is presented. The supporting device includes a first part that engages the supporting part of the lithographic projection apparatus; a second part that engages the supported part of the lithographic projection apparatus; a supporting spring system disposed between the first part and the second part; and a position control system configured to control a position of the supported part. The position control system comprises at least one reference object that is movable relative to the supporting part; a reference support device that supports the reference object relative to the first part, wherein the reference object and the reference support device form a reference mass-spring system; at least one position sensor that detects at least one attribute of the position of the second part relative to at least one of the reference objects, the position sensor including a sensor output for outputting a position signal representing at least one of the attributes; and an actuator, communicatively coupled to the position sensor, that is configured to adjust the position of …
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.